A New Frontier for Lasers
Talbot printing done with an EUV laser allows
nanoscale patterning of repetitive arrays that is
largely immune to mask defects. Courtesy of Mario
Marconi, Colorado State University.
This 46.9-nm laser allows single-shot full-field microscope imaging of nanostructures ranging from biological
samples to semiconductors. Courtesy of Carmen Menoni, Colorado State University.
An EUV laser (above) ionizes water clusters, yielding their mass spectrum (right) and composition. Courtesy of Elliot Bernstein, Colorado State University.
nique uses a mask composed of regular,
repeating elements arranged in a matrix.
Coherent light traveling through the mask
replicates the pattern in a plane where
photoresist can capture it. The method
offers a key advantage over alternatives.
“If you have a defect in one element
of the mask, the relationship between the
area of this defective element to the total
mask is so small that the defect will not
show up in the print,” Marconi said.
In a recent experiment, researchers
exposed a mask with an entire row of
defects. The substitution had no effect.
The scientists have printed 130-nm
features over areas that measure hun-
dreds of microns across. A paper on this
appeared in the November/December 2009